Method for making a dry etching resistant positive and negative

Details Method for making a dry etching resistant positive and negative Method for making a dry etching resistant positive and negative

1995-05-11

1996-08-27

Lesmes, George F.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430326, 430330, G03C 500

Patent

active

055500080

ABSTRACT:
A new photoresist composition suited for fine processing is provided which has practical applications in various dry etching processes. An advantageous pattern formation method using such a photoresist composition is also provided. The photoresist composition (1) includes a substance containing a skeleton as at least a part of the main chain. The skeleton is obtained through polymerization of a vinyl alcohol-type compound such as a polyvinyl alcohol chain, at least some hydroxyl groups in the skeleton being protected by protective groups capable of being released by an acid. The skeleton preferably contains a group for improving the dry etching resistance. The photoresistive composition also includes an optical acid generator. Development with a high polarity solvent, for instance aqueous development, is provided. A positive pattern is obtained by aqueous development and a negative pattern is obtained by alcohol development.

REFERENCES:
patent: 4491628 (1985-01-01), Ito et al.

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