Method for forming an electrical structure comprising...

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Making electrical device

Reexamination Certificate

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C430S327000

Reexamination Certificate

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07862987

ABSTRACT:
An electrical structure and method of forming. The method comprises providing a substrate structure. A first layer comprising a first photosensitive material having a first polarity is formed over and in contact with the substrate structure. A second layer comprising photosensitive material having a second polarity is formed over and in contact with the first layer. The first polarity comprises an opposite polarity as the second polarity. Portions of the first and second layers are simultaneously exposed to a photo exposure light source. The portions of the first and second layers are developed such that structures are formed.

REFERENCES:
patent: 4533624 (1985-08-01), Sheppard
patent: 4567132 (1986-01-01), Fredericks et al.
patent: 4606998 (1986-08-01), Clodgo et al.
patent: 6398430 (2002-06-01), Jeoung et al.
patent: 6586323 (2003-07-01), Fan et al.
patent: 6958546 (2005-10-01), Fan et al.
patent: 2007/0059650 (2007-03-01), Nagahara et al.

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