Method for forming a bottle-shaped trench

Details Method for forming a bottle-shaped trench Method for forming a bottle-shaped trench

2006-04-11

2006-04-11

Kennedy, Jennifer (Department: 2812)

Semiconductor device manufacturing: process

Making field effect device having pair of active regions...

Having insulated gate

C438S386000

Reexamination Certificate

active

07026210

ABSTRACT:
The invention provides a method for forming a bottle-shaped trench. A semiconductor substrate having a pad stack layer and a trench formed thereon is provided. Sidewall protective layers are then formed on the upper sidewalls of the trench. A masking layer is formed at the bottom of the trench, followed by wet etching to remove the semiconductor substrate not covered by the sidewall protective layers thus forming a bottle-shaped trench. Finally, the masking layer is removed.

REFERENCES:
patent: 5656097 (1997-08-01), Olesen et al.
patent: 5776808 (1998-07-01), Muller et al.
patent: 6127281 (2000-10-01), Sakaguchi et al.
patent: 6398904 (2002-06-01), Heo et al.
patent: 6426250 (2002-07-01), Lee et al.
patent: 6716696 (2004-04-01), Chen et al.
patent: 6770526 (2004-08-01), Chudzik et al.
patent: 6777303 (2004-08-01), Schrems et al.
patent: 6828191 (2004-12-01), Wurster et al.
patent: 2003/0020110 (2003-01-01), Tews et al.
patent: 2003/0068867 (2003-04-01), Forster et al.

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