Method for fabricating a gate structure

Details Method for fabricating a gate structure Method for fabricating a gate structure

2005-02-15

2005-02-15

Nhu, David (Department: 2818)

Semiconductor device manufacturing: process

Coating of substrate containing semiconductor region or of...

By reaction with substrate

C438S695000

Reexamination Certificate

active

06855643

ABSTRACT:
A method for fabricating a gate structure having a polysilicon electrode using an oxygen-free chemistry to etch the polysilicon. In one embodiment, the chemistry further includes nitrogen.

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