Method for dimensionally accurate structure transfer in bilayer

Details Method for dimensionally accurate structure transfer in bilayer Method for dimensionally accurate structure transfer in bilayer

1990-04-24

1993-08-10

Bowers, Jr., Charles L.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

430166, 430191, 430192, 430193, 430326, 156643, 156646, 156660, G03F 736, G03F 723, B44C 122

Patent

active

052347931

ABSTRACT:
A photolithographic method for structure generation in bilayer processes is provided. Pursuant to the method, a dimensional reserve is produced in a top resist structure by chemical treatment with a bulging agent. The expansion preferably is performed by treatment with an aqueous solution. The expansion can be set such that the dimensional loss to be anticipated in further etchings of the bottom resist or, respectively, of the wafer is exactly compensated for.

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