Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
Reexamination Certificate
2006-09-28
2010-10-19
Vinh, Lan (Department: 1713)
Etching a substrate: processes
Gas phase etching of substrate
With measuring, testing, or inspecting
C216S037000, C216S067000, C438S005000, C438S014000, C700S029000, C700S212000
Reexamination Certificate
active
07815812
ABSTRACT:
A method for controlling a process for fabricating integrated devices on a substrate. The method includes ex-situ and in-situ measurements of pre-etch and post-etch dimensions for structures formed on the substrate and uses the results of the measurements to adjust process recipes and to control the operational status of etch and external substrate processing equipment. In one exemplary application, the method is used during a multi-pass process for fabricating a capacitive structure of a trench capacitor.
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Davis Matthew F.
Lian Lei
Schmidt Barbara
Angadi Maki A
Applied Materials Inc.
Moser IP Law Group
Vinh Lan
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