Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Insulative material deposited upon semiconductive substrate
Reexamination Certificate
2005-03-22
2005-03-22
Nelms, David (Department: 2818)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
Insulative material deposited upon semiconductive substrate
C438S787000, C438S171000
Reexamination Certificate
active
06869895
ABSTRACT:
A method and apparatus for adjusting capacitance of an on-chip capacitor uses exposure of a dielectric material of the capacitor to an ion beam comprising ions of at least one material to modify a dielectric constant of the dielectric material.
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Clevenger Lawrence A.
Dalton Timothy J.
Hon Wong Keith Kwong
Hsu Louis L.
Radens Carl
Cheung, Esq. Wan Yae
International Business Machines - Corporation
Moser Patterson & Sheridan LLP
Nelms David
Nguyen Thinh T
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