Method and system for judging milling end point for use in charg

Details Method and system for judging milling end point for use in charg Method and system for judging milling end point for use in charg

1997-04-18

1999-09-14

Anderson, Bruce

Radiant energy

Inspection of solids or liquids by charged particles

Positive ion probe or microscope type

25049221, H01J 37304

Patent

active

059526580

ABSTRACT:
A charged particle beam milling system which is designed in such a way that a milling end point is judged to stop the milling on the basis of a change in the magnitude of secondary ion signals generated when milling an electronic device such as an LSI having a multi-wiring layer structure, in which a wiring layer and an insulating layer are laminated, using a charged particle beam.

REFERENCES:
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patent: 4661702 (1987-04-01), Welkie
patent: 4683378 (1987-07-01), Shimase et al.
patent: 5140164 (1992-08-01), Talbot et al.
patent: 5429730 (1995-07-01), Nakamura et al.
patent: 5504340 (1996-04-01), Mizumura et al.
patent: 5541411 (1996-07-01), Lindquist et al.
patent: 5639699 (1997-06-01), Nakamura et al.
J.Vac. Sci. Technol. B6(6), Nov./Dec. 1988, pp. 2100-2103.

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