4. Coating apparatus
  5. Gas or vapor deposition
  6. With treating means

Michinobu Mizumura

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Apparatus for processing a sample using a charged beam and react

Coating apparatus – Gas or vapor deposition – With treating means
Patent

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Etching aftertreatment method

Semiconductor device manufacturing: process – Chemical etching – Vapor phase etching
Reexamination Certificate

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Etching method of organic insulating film

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
Reexamination Certificate

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Etching method of organic insulating film

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
Reexamination Certificate

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Etching method of organic insulating film

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
Reexamination Certificate

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Profile ID: LFUS-PAI-P-70246

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