Image analysis – Pattern recognition – Feature extraction
Reexamination Certificate
2005-07-19
2005-07-19
Mehta, Bhavesh M. (Department: 2625)
Image analysis
Pattern recognition
Feature extraction
C250S202000, C250S491100, C250S559040, C250S559360, C348S087000, C348S094000, C356S237300, C356S238100, C356S399000, C382S144000, C382S145000, C382S266000, C382S283000
Reexamination Certificate
active
06920249
ABSTRACT:
A method and a measuring instrument for determining the position of an edge to be measured on a pattern on a substrate are described. A complete, nonlinear model intensity profile, which identifies the edge to be measured, of a model edge is ascertained and stored, and a desired edge position xkis defined therein with subpixel accuracy. A camera image of the substrate having the edge to be measured is acquired, and a one-dimensional measured intensity profile of the edge to be measured is determined therefrom. The model intensity profile is identified in the measured intensity profile with an indication of its location xmrelative to a reference point. The desired position p of the edge to be measured is determined with subpixel accuracy as p=xm+xk.
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Fricke Wolfgang
Rinn Klaus
Wienecke Joachim
Crowell & Moring LLP
Desire Gregory
Leica Microsystems Semiconductor GmbH
Mehta Bhavesh M.
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