Method and composition for polishing a substrate

Details Method and composition for polishing a substrate Method and composition for polishing a substrate

2007-06-19

2007-06-19

Ryan, Patrick Joseph (Department: 1745)

Electrolysis: processes, compositions used therein, and methods

Electrolytic erosion of a workpiece for shape or surface...

Local application of electrolyte

C205S682000

Reexamination Certificate

active

10456220

ABSTRACT:
Polishing compositions and methods for removing conductive materials from a substrate surface are provided. In one aspect, a composition includes an acid based electrolyte system, one or more chelating agents, one or more corrosion inhibitors, one or more inorganic or organic acid salts, one or more pH adjusting agents to provide a pH between about 2 and about 10, a polishing enhancing material selected from the group of abrasive particles, one or more oxidizers, and combinations thereof, and a solvent. The composition may be used in an conductive material removal process including disposing a substrate having a conductive material layer formed thereon in a process apparatus comprising an electrode, providing the composition between the electrode and substrate, applying a bias between the electrode and the substrate, and removing conductive material from the conductive material layer.

REFERENCES:
patent: 2582020 (1952-01-01), Emery
patent: 3239441 (1966-03-01), Marosi
patent: 3873512 (1975-03-01), Latanision
patent: 4263113 (1981-04-01), Bernard
patent: 4663005 (1987-05-01), Edson
patent: 4666683 (1987-05-01), Brown et al.
patent: 4793895 (1988-12-01), Kaanta et al.
patent: 4934102 (1990-06-01), Leach et al.
patent: 4992135 (1991-02-01), Doan
patent: 5002645 (1991-03-01), Eastland et al.
patent: 5096550 (1992-03-01), Mayer et al.
patent: 5114548 (1992-05-01), Rhoades
patent: 5129981 (1992-07-01), Wang et al.
patent: 5209816 (1993-05-01), Yu et al.
patent: 5217586 (1993-06-01), Datta et al.
patent: 5225034 (1993-07-01), Yu et al.
patent: 5256565 (1993-10-01), Bernhardt et al.
patent: 5340370 (1994-08-01), Cadien et al.
patent: 5391258 (1995-02-01), Brancaleoni et al.
patent: 5407526 (1995-04-01), Danielson et al.
patent: 5534106 (1996-07-01), Cote et al.
patent: 5543032 (1996-08-01), Datta et al.
patent: 5567300 (1996-10-01), Datta et al.
patent: 5575706 (1996-11-01), Tsai et al.
patent: 5770095 (1998-06-01), Sasaki et al.
patent: 5783489 (1998-07-01), Kaufman et al.
patent: 5807165 (1998-09-01), Uzoh et al.
patent: 5846882 (1998-12-01), Birang
patent: 5866031 (1999-02-01), Carpio et al.
patent: 5880003 (1999-03-01), Hayashi
patent: 5897375 (1999-04-01), Watts et al.
patent: 5911619 (1999-06-01), Uzoh et al.
patent: 5954997 (1999-09-01), Kaufman et al.
patent: 6001730 (1999-12-01), Farkas et al.
patent: 6004880 (1999-12-01), Liu et al.
patent: 6056864 (2000-05-01), Cheung
patent: 6063306 (2000-05-01), Kaufman et al.
patent: 6066030 (2000-05-01), Uzoh
patent: 6077412 (2000-06-01), Ting et al.
patent: 6083840 (2000-07-01), Mravic et al.
patent: 6090239 (2000-07-01), Liu et al.
patent: 6096652 (2000-08-01), Watts et al.
patent: 6099064 (2000-08-01), Lund
patent: 6103096 (2000-08-01), Datta et al.
patent: 6117775 (2000-09-01), Kondo et al.
patent: 6117783 (2000-09-01), Small et al.
patent: 6117853 (2000-09-01), Sakai et al.
patent: 6126853 (2000-10-01), Kaufman et al.
patent: 6143155 (2000-11-01), Adams et al.
patent: 6143656 (2000-11-01), Yang et al.
patent: 6153043 (2000-11-01), Edelstein et al.
patent: 6171352 (2001-01-01), Lee et al.
patent: 6176992 (2001-01-01), Talieh
patent: 6177026 (2001-01-01), Wang et al.
patent: 6190237 (2001-02-01), Huynh et al.
patent: 6194317 (2001-02-01), Kaisaki et al.
patent: 6206756 (2001-03-01), Chopra et al.
patent: 6217416 (2001-04-01), Kaufman et al.
patent: 6218305 (2001-04-01), Hosali et al.
patent: 6234870 (2001-05-01), Uzoh et al.
patent: 6238592 (2001-05-01), Hardy et al.
patent: 6248222 (2001-06-01), Wang
patent: 6258711 (2001-07-01), Laursen
patent: 6258721 (2001-07-01), Li et al.
patent: 6273786 (2001-08-01), Chopra et al.
patent: 6276996 (2001-08-01), Chopra
patent: 6293848 (2001-09-01), Fang et al.
patent: 6303049 (2001-10-01), Lee et al.
patent: 6303551 (2001-10-01), Li et al.
patent: 6310019 (2001-10-01), Kakizawa et al.
patent: 6315803 (2001-11-01), Ina et al.
patent: 6315883 (2001-11-01), Mayer et al.
patent: 6348076 (2002-02-01), Canaperi et al.
patent: 6354916 (2002-03-01), Uzoh et al.
patent: 6355075 (2002-03-01), Ina et al.
patent: 6355153 (2002-03-01), Uzoh et al.
patent: 6375693 (2002-04-01), Cote et al.
patent: 6391166 (2002-05-01), Wang
patent: 6395152 (2002-05-01), Wang
patent: 6416685 (2002-07-01), Zhang et al.
patent: 6419554 (2002-07-01), Chopra et al.
patent: 6428721 (2002-08-01), Ina et al.
patent: 6429133 (2002-08-01), Chopra
patent: 6440186 (2002-08-01), Sakai et al.
patent: 6440295 (2002-08-01), Wang
patent: 6449371 (2002-09-01), Tan et al.
patent: 6454819 (2002-09-01), Yano et al.
patent: 6455479 (2002-09-01), Sahbari
patent: 6508952 (2003-01-01), Lee et al.
patent: 6541384 (2003-04-01), Sun et al.
patent: 6551935 (2003-04-01), Sinha et al.
patent: 6555158 (2003-04-01), Yoshio et al.
patent: 6562719 (2003-05-01), Kondo et al.
patent: 6565619 (2003-05-01), Asano et al.
patent: 6568997 (2003-05-01), Costas et al.
patent: 6579153 (2003-06-01), Uchikura et al.
patent: 6593239 (2003-07-01), Kaufman et al.
patent: 6593638 (2003-07-01), Kondo et al.
patent: 6602112 (2003-08-01), Tran et al.
patent: 6605537 (2003-08-01), Bian et al.
patent: 6616976 (2003-09-01), Montano et al.
patent: 6620215 (2003-09-01), Li et al.
patent: 6676484 (2004-01-01), Chopra
patent: 6679928 (2004-01-01), Costas et al.
patent: 6679929 (2004-01-01), Asano et al.
patent: 6693036 (2004-02-01), Nogami et al.
patent: 6867136 (2005-03-01), Basol et al.
patent: 6893476 (2005-05-01), Siddiqui et al.
patent: 6946066 (2005-09-01), Basol et al.
patent: 2001/0016469 (2001-08-01), Chopra
patent: 2001/0024878 (2001-09-01), Nakamura et al.
patent: 2001/0036746 (2001-11-01), Sato et al.
patent: 2001/0042690 (2001-11-01), Talieh et al.
patent: 2001/0052351 (2001-12-01), Brown et al.
patent: 2002/0008036 (2002-01-01), Wang
patent: 2002/0016064 (2002-02-01), Komai et al.
patent: 2002/0016272 (2002-02-01), Kakizawa et al.
patent: 2002/0040100 (2002-04-01), Kume et al.
patent: 2002/0070126 (2002-06-01), Sato et al.
patent: 2002/0072309 (2002-06-01), Sato et al.
patent: 2002/0074230 (2002-06-01), Basoi
patent: 2002/0088709 (2002-07-01), Hongo et al.
patent: 2002/0096659 (2002-07-01), Sakai et al.
patent: 2002/0104764 (2002-08-01), Gautam et al.
patent: 2002/0108861 (2002-08-01), Emesh et al.
patent: 2002/0130049 (2002-09-01), Chen et al.
patent: 2002/0139055 (2002-10-01), Asano et al.
patent: 2002/0160698 (2002-10-01), Sato et al.
patent: 2002/0182982 (2002-12-01), Jui-Lung et al.
patent: 2003/0038038 (2003-02-01), Basol et al.
patent: 2003/0073311 (2003-04-01), Joseph et al.
patent: 2003/0073386 (2003-04-01), Ma et al.
patent: 2003/0079416 (2003-05-01), Ma et al.
patent: 2003/0083214 (2003-05-01), Kakizawa et al.
patent: 2003/0104762 (2003-06-01), Sato et al.
patent: 2003/0113996 (2003-06-01), Nogami et al.
patent: 2003/0114004 (2003-06-01), Sato et al.
patent: 2003/0115475 (2003-06-01), Russo et al.
patent: 2003/0116445 (2003-06-01), Sun et al.
patent: 2003/0116446 (2003-06-01), Duboust et al.
patent: 2003/0119311 (2003-06-01), Basol et al.
patent: 2003/0136055 (2003-07-01), Li et al.
patent: 2003/0153184 (2003-08-01), Wang et al.
patent: 2003/0170091 (2003-09-01), Shomler et al.
patent: 2003/0178320 (2003-09-01), Liu et al.
patent: 2003/0216045 (2003-11-01), Wang et al.
patent: 2003/0234184 (2003-12-01), Liu et al.
patent: 2004/0053499 (2004-03-01), Liu et al.
patent: 2004/0248412 (2004-12-01), Liu et al.
patent: 2005/0044803 (2005-03-01), Siddiqui et al.
patent: 2005/0565378 (2005-03-01), Chen et al.
patent: 2005/0227483 (2005-10-01), Basol et al.
patent: 2006/0009033 (2006-01-01), Basol et al.
patent: 2006/0011485 (2006-01-01), Basol et al.
patent: 0 527 537 (1993-02-01), None
patent: 0 699 782 (1996-03-01), None
patent: 0 811 665 (1997-12-01), None
patent: 0 846 742 (1998-06-01), None
patent: 0846742 (1998-06-01), None
patent: 1 170 761 (2000-03-01), None
patent: 1 103 346 (2001-05-01), None
patent: 1103346 (2001-05-01), None
patent: 1 167 585 (2002-01-01), None
patent: 1 170 761 (2002-09-01), None
patent: 1 410430 (2004-04-01), None
patent: 58-093886 (1983-06-01), None
patent: 58-093899 (1983-06-01), None
patent: 05 302199 (1993-11-01), None
patent: 06 1583

Affiliated with

Also associated with

Rating

Method and composition for polishing a substrate does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and composition for polishing a substrate, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and composition for polishing a substrate will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3811607