4. Cleaning and liquid contact with solids
  5. Processes
  6. Including application of electrical radiant or wave energy...

Steven Verhaverbeke

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Ammonium hydroxide treatments for semiconductor substrates

Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate

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Ammonium hydroxide treatments for semiconductor substrates

Cleaning compositions for solid surfaces – auxiliary compositions – Cleaning compositions or processes of preparing – For cleaning a specific substrate or removing a specific...
Reexamination Certificate

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Ammonium hydroxide treatments for semiconductor substrates

Semiconductor device manufacturing: process – Chemical etching – Combined with the removal of material by nonchemical means
Reexamination Certificate

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Assisted rinsing in a single wafer cleaning process

Cleaning and liquid contact with solids – Processes – Including application of electrical radiant or wave energy...
Reexamination Certificate

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Cleaning method and solution for cleaning a wafer in a...

Semiconductor device manufacturing: process – Chemical etching – Liquid phase etching
Reexamination Certificate

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Profile ID: LFUS-PAI-P-570235

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