Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
Patent
1988-05-20
1989-12-05
Weisstuch, Aaron
Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
20419212, 204298, C23C 1446
Patent
active
048850705
ABSTRACT:
An apparatus to apply materials to a substrate disposed in a vacuum chamber is disclosed. A separate generator chamber containing an electron emitter is connected to the vacuum chamber by a process chamber so that a plasma of controllable cross-sectional shape and large area is formed and guided by magnets toward a target system. Positive ions may be accelerated against the target by applying an adjustable negative voltage.
REFERENCES:
patent: 2043966 (1936-06-01), Whiston et al.
patent: 2146025 (1939-02-01), Penning
patent: 3331961 (1967-07-01), Le boutet et al.
patent: 3409529 (1968-11-01), Chopra et al.
patent: 3472751 (1969-10-01), King
patent: 3576729 (1971-04-01), Sigournay et al.
patent: 3895602 (1975-07-01), Bobenrieth
patent: 3916034 (1975-10-01), Tsuchimoto
patent: 4033843 (1977-07-01), Krikorian et al.
patent: 4046666 (1977-09-01), McClanahan et al.
patent: 4080281 (1978-03-01), Endo
patent: 4090941 (1978-05-01), Wright et al.
patent: 4108751 (1978-08-01), King
patent: 4128466 (1978-12-01), Harding et al.
patent: 4166018 (1979-08-01), Chapin
patent: 4250009 (1981-02-01), Cuomo et al.
patent: 4416755 (1983-11-01), Caesar et al.
patent: 4420386 (1983-12-01), White
patent: 4471003 (1984-09-01), Cann
patent: 4487162 (1984-12-01), Cann
patent: 4492620 (1985-01-01), Matsuo et al.
patent: 4588490 (1986-05-01), Cuomo et al.
patent: 4607193 (1986-08-01), Curren et al.
patent: 4626399 (1986-12-01), Cohen et al.
patent: 4639301 (1987-01-01), Doherty et al.
patent: 4645342 (1987-02-01), Tanimoto et al.
patent: 4662977 (1987-05-01), Motley et al.
patent: 4682564 (1987-07-01), Cann
Loschialpo & Kapetanakos, "High Current Density . . . Hexaboride Cathodes" Journal of Applied Physics, 63(8), Apr. 15, 1988.
Porkolab et al., Nuclear Fusion, vol. 21, No. 12 (1981) Electron Cyclotron Resonance Heating of Plasmas in Tandem Mirrors.
Mioduszewski, P. J. Nuclear Materials, 111 & 112 (1982) 253-267, Experimental Studies on Pump Limiters.
Conn, R. W., Proc. IX IVC-V ICCS, Madrid (1983) Tokamak Advanced Pump Limiter Experiments and Analysis.
Goebel et al., J. Nuclear Materials, 121 (1984) 277-282, Plasma Surface Interaction Experimental Facility (Pisces) for Materials and Edge Physics Studies.
Goebel et al ., J. Nuclear Materials, 128 & 129 (1984) 249-252, Observation of Enhanced Particle Removal Rates in Pump Limiter Simulation Experiments.
Goebel et al., Rev. Sci. Instrum., 56(9), Sep. 1985, Large-Area Lanthanum Hexaboride Electron Emitter.
Hirooka et al., J. Nuclear Materials 141-143 (1986) 193-197, Materials Erosion and Redeposition Studies at the Pisces Facility-Net Erosion Under Redeposition.
Goebel et al., J. Nuclear Materials, 145-147 (1987) 61-70, Erosion and Redeposition Experiments in the Pisces Facility.
Adam Rolf
Aichert Hans
Betz Hans
Campbell Gregor A.
Conn Robert W.
Leybold Aktiengesellschaft
Weisstuch Aaron
LandOfFree
Method and apparatus for the application of materials does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for the application of materials, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for the application of materials will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2032701