4. X-ray or gamma ray systems or devices
  5. Specific application
  6. Lithography

Hans Betz

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Arrangement for exposing semiconductor wafers by means of a sync

X-ray or gamma ray systems or devices – Specific application – Lithography
Patent

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Method and apparatus for the application of materials

Chemistry: electrical and wave energy – Processes and products – Coating – forming or etching by sputtering
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Method for producing separating nozzle elements for the separati

Chemistry: electrical and wave energy – Processes and products
Patent

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Process for imaging laserinterferometry and a laserinterferomete

Optics: measuring and testing – By dispersed light spectroscopy – Utilizing a spectrometer
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Profile ID: LFUS-PAI-P-1094096

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