Method and apparatus for processing a wafer

Details Method and apparatus for processing a wafer Method and apparatus for processing a wafer

2007-01-09

2007-01-09

Whitehead, Jr., Carl (Department: 2813)

Cleaning and liquid contact with solids

Apparatus

With treating fluid purifying or separating means

Reexamination Certificate

active

10229446

ABSTRACT:
A method of a single wafer wet/dry cleaning apparatus comprising:a transfer chamber having a wafer handler contained therein;a first single wafer wet cleaning chamber directly coupled to the transfer chamber; anda first single wafer ashing chamber directly coupled to the transfer chamber.

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International Search Report PCT/US 02/25773.

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