Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With mechanical mask – shield or shutter for shielding workpiece
Reexamination Certificate
2011-03-22
2011-03-22
Hassanzadeh, Parviz (Department: 1716)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With mechanical mask, shield or shutter for shielding workpiece
C156S345330, C156S345340, C156S345350, C156S345430, C118S7230ER, C118S7230IR, C118S7230IR, C118S7230MW, C118S7230ER, C118S7230ME
Reexamination Certificate
active
07909961
ABSTRACT:
A method and apparatus for etching photomasks are provided herein. The apparatus includes a process chamber with a shield above a substrate support. The shield comprises a plate with apertures, and the plate has two zones with at least one characteristic, such as material or potential bias, that is different from each other. The method provides for etching a photomask substrate with a distribution of ions and neutral species that pass through the shield.
REFERENCES:
patent: 4496420 (1985-01-01), Frohlich et al.
patent: 4600464 (1986-07-01), Desilets et al.
patent: 5024748 (1991-06-01), Fujimura
patent: 5075256 (1991-12-01), Wang et al.
patent: 5556500 (1996-09-01), Hasegawa et al.
patent: 5593540 (1997-01-01), Tomita et al.
patent: 5605637 (1997-02-01), Shan et al.
patent: 5614026 (1997-03-01), Williams
patent: 5673922 (1997-10-01), Sherstinsky et al.
patent: 5972781 (1999-10-01), Wegleiter et al.
patent: 6129808 (2000-10-01), Wicker et al.
patent: 6167835 (2001-01-01), Ootera et al.
patent: 6190496 (2001-02-01), DeOrnellas et al.
patent: 6203657 (2001-03-01), Collison et al.
patent: 6261406 (2001-07-01), Jurgensen et al.
patent: 6270687 (2001-08-01), Ye et al.
patent: 6287643 (2001-09-01), Powell et al.
patent: 6290806 (2001-09-01), Donohoe
patent: 6299689 (2001-10-01), Wang et al.
patent: 6306244 (2001-10-01), Kennedy et al.
patent: 6335293 (2002-01-01), Luo et al.
patent: 6339206 (2002-01-01), Johnson
patent: 6364949 (2002-04-01), Or et al.
patent: 6375748 (2002-04-01), Yudovsky et al.
patent: 6514378 (2003-02-01), Ni et al.
patent: 6521010 (2003-02-01), Katata
patent: 6521292 (2003-02-01), Yudovsky et al.
patent: 6551447 (2003-04-01), Savas et al.
patent: 6553332 (2003-04-01), Leng
patent: 6589352 (2003-07-01), Yudovsky et al.
patent: 6656322 (2003-12-01), Hongo et al.
patent: 6676800 (2004-01-01), Festa et al.
patent: 6676803 (2004-01-01), Kim
patent: 6692649 (2004-02-01), Collison et al.
patent: 6782843 (2004-08-01), Kinnard et al.
patent: 6805779 (2004-10-01), Chistyakov
patent: 6806651 (2004-10-01), Chistyakov
patent: 6806949 (2004-10-01), Ludviksson et al.
patent: 6837966 (2005-01-01), Nishimoto et al.
patent: 6868800 (2005-03-01), Moroz
patent: 6872259 (2005-03-01), Strang
patent: 6926802 (2005-08-01), Lee
patent: 6949165 (2005-09-01), Koshimizu
patent: 7037846 (2006-05-01), Srivastava et al.
patent: 7241345 (2007-07-01), Ramamurthy et al.
patent: 7609002 (2009-10-01), Lee
patent: 2002/0033233 (2002-03-01), Savas
patent: 2002/0121501 (2002-09-01), Choquette et al.
patent: 2002/0142612 (2002-10-01), Wu et al.
patent: 2002/0185229 (2002-12-01), Brcka et al.
patent: 2002/0189762 (2002-12-01), Kim
patent: 2003/0010448 (2003-01-01), Lee
patent: 2003/0019580 (2003-01-01), Strang et al.
patent: 2003/0047536 (2003-03-01), Johnson
patent: 2003/0089680 (2003-05-01), Johnson et al.
patent: 2003/0094643 (2003-05-01), Yang
patent: 2003/0194510 (2003-10-01), Nguyen et al.
patent: 2003/0209324 (2003-11-01), Fink
patent: 2003/0217812 (2003-11-01), Yoshiki et al.
patent: 2004/0000535 (2004-01-01), Mueller et al.
patent: 2004/0003780 (2004-01-01), Yudovsky et al.
patent: 2004/0031565 (2004-02-01), Su et al.
patent: 2004/0035532 (2004-02-01), Jung
patent: 2004/0069227 (2004-04-01), Ku et al.
patent: 2004/0079725 (2004-04-01), Inomata et al.
patent: 2004/0083975 (2004-05-01), Tong et al.
patent: 2004/0129226 (2004-07-01), Strang et al.
patent: 2004/0140853 (2004-07-01), Cyrusian
patent: 2004/0192043 (2004-09-01), Makita et al.
patent: 2004/0212312 (2004-10-01), Chistyakov
patent: 2004/0219737 (2004-11-01), Quon
patent: 2004/0250772 (2004-12-01), Ramamurthy et al.
patent: 2004/0261718 (2004-12-01), Kim et al.
patent: 2005/0006344 (2005-01-01), Tanaka
patent: 2005/0011447 (2005-01-01), Fink
patent: 2005/0066902 (2005-03-01), Fink
patent: 2005/0087302 (2005-04-01), Mardian et al.
patent: 2005/0133164 (2005-06-01), Fischer et al.
patent: 2005/0139317 (2005-06-01), Wu et al.
patent: 2005/0241583 (2005-11-01), Buechel et al.
patent: 2005/0241767 (2005-11-01), Ferris et al.
patent: 2005/0263070 (2005-12-01), Fink
patent: 2005/0284370 (2005-12-01), Strang
patent: 2006/0000802 (2006-01-01), Kumar et al.
patent: 2006/0000805 (2006-01-01), Todorow et al.
patent: 2006/0060303 (2006-03-01), Fink et al.
patent: 2006/0213865 (2006-09-01), Honda et al.
patent: 2006/0260747 (2006-11-01), Hirose et al.
patent: 2007/0000614 (2007-01-01), Hatamura et al.
patent: 2007/0015504 (2007-01-01), Kusuda et al.
patent: 2007/0017898 (2007-01-01), Kumar et al.
patent: 2007/0044719 (2007-03-01), Ku et al.
patent: 2008/0072823 (2008-03-01), Yudovsky et al.
patent: 2008/0099431 (2008-05-01), Kumar et al.
patent: 2008/0101978 (2008-05-01), Ryabova et al.
patent: 0488393 (1992-06-01), None
patent: 0496564 (1992-07-01), None
patent: 0522296 (1993-01-01), None
patent: 0 702 392 (1996-03-01), None
patent: 0930642 (1999-07-01), None
patent: 1024520 (2000-08-01), None
patent: 1355342 (2003-10-01), None
patent: 1 612 840 (2006-01-01), None
patent: 1612840 (2006-01-01), None
patent: 1686421 (2006-08-01), None
patent: 62299031 (1987-12-01), None
patent: 02-184029 (1990-07-01), None
patent: 08-148473 (1996-06-01), None
patent: 9115836 (1997-05-01), None
patent: 11067727 (1999-03-01), None
patent: 2004165298 (2004-06-01), None
patent: 20010039233 (2001-05-01), None
patent: 013170 (2004-02-01), None
patent: 2005-0067405 (2005-07-01), None
patent: 2006-0048674 (2006-05-01), None
patent: 502290 (2002-09-01), None
patent: WO-9850600 (1998-11-01), None
patent: WO-03/036704 (2003-05-01), None
patent: WO-03/054912 (2003-07-01), None
patent: WO03054912 (2003-07-01), None
patent: 2007/015504 (2007-02-01), None
patent: WO-2007/015504 (2007-02-01), None
Partial European Search Report dated Jan. 30, 2008 for International Application No. 07020931.7.
Extended European Search Report for EP 07020930.9 mailed Feb. 28, 2008.
Extended European Search Report for EP 07020931.7 mailed Apr. 18, 2008.
European Search Report of EP 07 02 0931, dated Apr. 18, 2008, consists of nine unnumbered pages.
Official Letter dated Jun. 24, 2009 from Korean Patent Office for corresponding Korean Patent application 10-2007-0086473. A Concise Statement of Relevance is provided.
Official Letter dated Jun. 23, 2009 fro Korean Patent Office for corresponding Korean Patent application 10-2007-0086475. A Concise Statement of Relevance is provided.
Notice to File a Response for Korean Patent Application No. 10-2007-0086475 dated Dec. 24, 2009.
Extended Search Report for corresponding European Patent Application No. 07020931.7 dated Apr. 18, 2008.
European Patent Office Communication pursuant to Rule 69 EPC dated May 27, 2008 for corresponding Patent Application No. 07020931.7.
Notice to File a Response from the Korean Intellectual Property Office dated Dec. 11, 2008 for corresponding Korean Patent Application No. 10-2007-0086473. A Concise Statement of Relevance is provided.
Chinese First Office Action dated Apr. 29, 2010 for Chinese Application No. 200710143238.X. (Appm/011454CN02).
Prosecution history of U.S. Appl. No. 10/882,084, as of Sep. 7, 2010.
Prosecution history of U.S. Appl. No. 10/880,754, as of Sep. 7, 2010.
Prosecution history of U.S. Appl. No. 11/530,659, as of Sep. 7, 2010.
Prosecution history of U.S. Appl. No. 11/554,502, as of Sep. 7, 2010.
Official Letter dated Sep. 1, 2010, from Taiwan Patent Office for corresponding Taiwan Patent application No., 95146522.
Official Letter dated Aug. 9, 2010, from Taiwan Patent Office for corresponding Taiwan Patent application No., 95146522.
Bivens Darin
Chandrachood Madhavi R.
Kumar Ajay
Lewington Richard
Ouye Alan Hiroshi
Applied Materials Inc.
Dhingra Rakesh
Hassanzadeh Parviz
Patterson & Sheridan LLP
LandOfFree
Method and apparatus for photomask plasma etching does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for photomask plasma etching, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for photomask plasma etching will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2768686