Method and apparatus for photomask plasma etching

Details Method and apparatus for photomask plasma etching Method and apparatus for photomask plasma etching

2011-05-17

2011-05-17

Vinh, Lan (Department: 1713)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

With mechanical mask, shield or shutter for shielding workpiece

C156S345330, C438S731000

Reexamination Certificate

active

07943005

ABSTRACT:
A method and apparatus for etching photomasks is provided herein. In one embodiment, the apparatus comprises a process chamber having a support pedestal adapted for receiving a photomask. An ion-neutral shield is disposed above the pedestal and a deflector plate assembly is provided above the ion-neutral shield. The deflector plate assembly defines a gas flow direction for process gases towards the ion-neutral shield, while the ion-neutral shield is used to establish a desired distribution of ion and neutral species in a plasma for etching the photomask.

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