Optics: measuring and testing – Angle measuring or angular axial alignment – Sides of angle or axes being aligned transverse to optical...
Patent
1995-03-07
1997-07-15
Hantis, K.
Optics: measuring and testing
Angle measuring or angular axial alignment
Sides of angle or axes being aligned transverse to optical...
356371, G01B 100, G01B 1130
Patent
active
056488475
ABSTRACT:
In an etch monitor system, a method and apparatus for adjusting the angle of incidence to normal between a laser beam and a reflective surface, such as a silicon wafer, includes a rotatable mirror having a pinhole formed therethrough, the rotatable mirror moveably mounted to be positioned in a first location within a light path and a second location out of said light path. When the rotatable mirror is located in the light path, the pinhole allows a beam of the laser beam to pass from a laser source to the reflective surface. If the beam is normal to the reflective surface, the beam is directed back toward the laser source through the pinhole. If the beam is not normal to the reflective surface, the beam is reflected by the rotatable mirror to a target, allowing observation on a lit spot of the target to enable normalization by making appropriate adjustments.
REFERENCES:
patent: 3554653 (1971-01-01), Zielke et al.
patent: 4125755 (1978-11-01), Plamquist
patent: 4769523 (1988-09-01), Tanimoto et al.
patent: 4998260 (1991-03-01), Taniura
Applied Materials Inc.
Hantis K.
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