Optics: measuring and testing – By configuration comparison – With photosensitive film or plate
Patent
1997-04-14
1998-05-19
Pham, Hoa Q.
Optics: measuring and testing
By configuration comparison
With photosensitive film or plate
25055927, 438 16, 427 10, G01B 1106
Patent
active
057542970
ABSTRACT:
A deposition rate monitor based on the measurement of optical attenuation is described for use in deposition equipment such as sputtering systems used to deposit thin metal films on semiconductor devices. A beam of light is passed through the region between a deposition source and the deposition substrate. The beam of light is attenuated by the material being transported from the source to the substrate before the light is detected at a detector. The level of attenuation of the light passing through the deposition environment can be empirically related to the rate at which material is being deposited on the substrate. The optical absorption deposition rate monitor can be used to adjust processing variables to maintain a constant deposition rate.
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Applied Materials Inc.
Konrad William
Pham Hoa Q.
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