Optics: measuring and testing – Inspection of flaws or impurities – Surface condition
Reexamination Certificate
2005-10-17
2008-10-07
Lauchman, L. G. (Department: 2877)
Optics: measuring and testing
Inspection of flaws or impurities
Surface condition
C356S394000, C356S398000, C382S144000, C382S145000
Reexamination Certificate
active
07433032
ABSTRACT:
In a method of inspecting defects, a first actual region of an actual object is inspected based on a first characteristic parameter as an inspection condition. A point where an inspection region of the actual object is changed into a second actual region from the first actual region is determined. The second actual region is then inspected based on a second characteristic parameter as the inspection condition. The first and second parameters may include contrast of a light that is reflected from a reference object, intensity of the light, brightness of the light, a size of a minute structure on the reference object, etc. The characteristic parameters of each reference region on the reference object are set. Thus, the defects may be accurately classified so that a time and a cost for reviewing the defects may be markedly reduced.
REFERENCES:
patent: 6437862 (2002-08-01), Miyazaki et al.
patent: 6614519 (2003-09-01), Latta et al.
patent: 6850320 (2005-02-01), Shibata et al.
patent: 2003/0223058 (2003-12-01), Leong et al.
patent: 2004/0057611 (2004-03-01), Lee et al.
patent: 2004/0105578 (2004-06-01), Tsuchiya et al.
patent: 2004/0169850 (2004-09-01), Meeks
patent: 2002-148031 (2002-05-01), None
patent: 2003-49312 (2003-06-01), None
patent: 2003-52657 (2003-06-01), None
English language abstract of Japanese Publication No. 2002-148031.
English language abstract of Korean Publication No. 2003-49312.
English language abstract of Korean Publication No. 2003-52657.
Chon Sang-Mun
Jun Chung-Sam
Kim Joung-Soo
Yang Yu-Sin
Lauchman L. G.
Marger & Johnson & McCollom, P.C.
Samsung Electronics Co,. Ltd.
Slomski Rebecca C
LandOfFree
Method and apparatus for inspecting defects in multiple... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Method and apparatus for inspecting defects in multiple..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for inspecting defects in multiple... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-3989659