Method and apparatus for generating a low pressure plasma

Details Method and apparatus for generating a low pressure plasma Method and apparatus for generating a low pressure plasma

1996-07-08

1999-06-29

Dang, Thi

Etching a substrate: processes

Gas phase etching of substrate

Application of energy to the gaseous etchant or to the...

438729, 438730, 156345, 118723I, 118723IR, 118723MP, H05H 100

Patent

active

059164557

ABSTRACT:
A low pressure plasma ignition method and apparatus includes an ignition cylinder which passes through an anode of a vacuum chamber, where the outlet of the ignition cylinder forms a nozzle. A coil is arranged around the cylinder and a plasma-generating gas supply pipe passes through an upper part of the cylinder. A plasma-generating gas, such as Argon gas, is supplied to the ignition cylinder in this structure, such that a high density plasma is formed in the ignition cylinder that is expelled into the vacuum chamber while the pressure is reduced through the nozzle. In the vacuum chamber, the expelled plasma becomes a seed plasma, such that a low pressure plasma is readily generated in the vacuum chamber.

REFERENCES:
patent: 5449432 (1995-09-01), Hanawa
patent: 5476182 (1995-12-01), Ishizuka et al.
patent: 5683548 (1997-11-01), Hartig et al.

Affiliated with

Also associated with

Rating

Method and apparatus for generating a low pressure plasma does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Method and apparatus for generating a low pressure plasma, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Method and apparatus for generating a low pressure plasma will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-1373207