Hiromi Kumagai

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Heating furnace for semiconductor wafers

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Magnetron plasma processing apparatus and processing method

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
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Magnetron plasma processing apparatus and processing method

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent

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Magnetron plasma processing apparatus and processing method

Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With microwave gas energizing means
Patent

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Method and apparatus for generating a low pressure plasma

Etching a substrate: processes – Gas phase etching of substrate – Application of energy to the gaseous etchant or to the...
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Profile ID: LFUS-PAI-P-671171

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