Semiconductor device manufacturing: process – Coating of substrate containing semiconductor region or of... – Multiple layers
Reexamination Certificate
2006-07-04
2006-07-04
Picardat, Kevin M. (Department: 2822)
Semiconductor device manufacturing: process
Coating of substrate containing semiconductor region or of...
Multiple layers
C438S763000, C118S7230ER, C118S7230AN
Reexamination Certificate
active
07071118
ABSTRACT:
A method and apparatus for fabricating a conformal thin film on a substrate are disclosed. The method includes introducing a gas from a gas inlet into an expansion volume associated with an atomic layer deposition (ALD) system. The gas is flowed through a diffuser plate adjacent to the expansion volume and a reaction chamber. The diffuser plate includes a protrusion located opposite the gas inlet and the protrusion reduces turbulence in the expansion volume.
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Bubber Randhir
Kools Jacques C. S.
Mao Ming
Schneider Thomas Andrew
Wang Jinsong
Baker & Botts L.L.P.
Picardat Kevin M.
Veeco Instruments Inc.
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