Method and apparatus for detecting a photolithography...

Details Method and apparatus for detecting a photolithography... Method and apparatus for detecting a photolithography...

2004-07-30

2009-08-11

Punnoose, Roy (Department: 2886)

Optics: measuring and testing

Inspection of flaws or impurities

Surface condition

C356S237500

Reexamination Certificate

active

07573568

ABSTRACT:
An apparatus for monitoring a photolithography process includes a measurer and a data processor. The measurer measures an optical characteristic of a substrate. The data processor determines defectiveness of the substrate based on the optical the measurer.

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