Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field
Patent
1996-05-08
1998-06-09
Fleming, Fritz
Electricity: electrical systems and devices
Electric charge generating or conducting means
Use of forces of electric charge or field
H02N 1300
Patent
active
057644713
ABSTRACT:
An electrostatic chuck containing apparatus, and a concomitant method, for balancing the electrostatic force that the chuck imparts upon a workpiece. More specifically, the electrostatic chuck contains a chuck body having a pair of coplanar electrodes embedded therein and a wafer spacing mask containing a plurality of conductive support members deposited upon a support surface of the chuck body. The support members maintain a wafer, or other workpiece, in a spaced-part relation with respect to the support surface of the chuck body. Each electrode within the chuck is respectively connected to a terminal dual voltage power supply having a center tap. The center tap of the power supply is connected to the wafer spacing mask. As such, variations in the distance between the wafer and the electrodes due to variations in dielectric thickness, wafer backside roughness, chuck surface roughness, chuck surface conductivity or other physical variations that may cause changes in the electrostatic force are balanced by having the spacing mask connected to the center tap of the power supply.
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Applied Materials Inc.
Fleming Fritz
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