Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent
1995-03-07
1996-07-09
Dang, Thi
Adhesive bonding and miscellaneous chemical manufacture
Delaminating processes adapted for specified product
Delaminating in preparation for post processing recycling step
156345, H05H 100
Patent
active
055341080
ABSTRACT:
A magnetic field enhanced plasma etch reactor system and method of operation is disclosed. In the system and operation, modulated sinusoidal currents are generated and applied 90.degree. out of phase to opposing pairs of series connected electromagnets to produce a modified rotating magnetic field parallel to a substrate processed in the system. The modification of the rotating magnetic field, in turn, results in an improvement in the uniformity of the etch pattern over the upper surface of the substrate.
REFERENCES:
patent: 4740268 (1988-04-01), Bukhman
patent: 4829215 (1989-05-01), Kim et al.
patent: 4919783 (1990-04-01), Asamaki et al.
patent: 5087857 (1992-02-01), Ahn
Hills Graham W.
Qian Xue-Yu
Steger Robert
Yin Gerald
Applied Materials Inc.
Dang Thi
Moser, Jr. Raymond R.
Sgarbossa Peter J.
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