Chemistry: electrical and wave energy
Processes and products
Coating, forming or etching by sputtering
Inventor
active
Etched patterned copper features free from etch process residue
Gas distribution assembly for use in a semiconductor work...
High pressure high non-reactive diluent gas content high...
Inductively coupled RF plasma reactor having an overhead solenoi
Inductively coupled RF Plasma reactor having an overhead...
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Profile ID: LFUS-PAI-P-1213660