Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Reexamination Certificate
2009-02-27
2010-11-23
Dang, Phuc T (Department: 2892)
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
C438S197000, C438S268000, C257S302000, C257S401000
Reexamination Certificate
active
07838360
ABSTRACT:
A memory array with staggered local data/bit lines extending generally in a first direction formed in an upper surface of a substrate and memory cell access transistors extending generally upward and aligned generally atop a corresponding local data/bit line. Selected columns of the memory cell access transistors are sacrificed to define local data/bit access transistors which are interconnected with overlying low resistance global data/bit lines. The global data/bit lines provide selectable low resistance paths between memory cells and sense amplifiers. The sacrificed memory cell access transistors and staggered local data/bit lines provide increased footprints for sense amplifiers to facilitate increased circuit integration.
REFERENCES:
patent: 7091566 (2006-08-01), Zhu et al.
patent: 7510954 (2009-03-01), Forbes
Dang Phuc T
Knobbe Martens Olson & Bear LLP
Micro)n Technology, Inc.
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