Measurement to determine plasma leakage

Details Measurement to determine plasma leakage Measurement to determine plasma leakage

2006-10-03

2006-10-03

Norton, Nadine (Department: 1765)

Etching a substrate: processes

Gas phase etching of substrate

With measuring, testing, or inspecting

C216S061000, C118S712000, 27, C438S014000, C438S016000, C455S118000

Reexamination Certificate

active

07115210

ABSTRACT:
Disclosed is a method and system for detecting abnormal plasma discharge that is useful in, for example, detecting plasma leakage in a reactive ion etching (RIE) chamber. The system includes electrical contacts connected to the chamber that provide an input signal to the chamber. This input signal can be generated by a radio frequency (RF) generator that is connected to the electrical contacts. A variable power controller connected to the RF generator gradually increases (ramps) the power of the input signal being supplied to the chamber.

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