Mask used for LIGA process, method of manufacturing the...

Details Mask used for LIGA process, method of manufacturing the... Mask used for LIGA process, method of manufacturing the...

2007-08-30

2009-10-27

Yun, Jurie (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Lithography

C378S034000, C430S005000

Reexamination Certificate

active

07609805

ABSTRACT:
A mask used for a Lithographie, Galvanofomung, and Abformung (LIGA) process, a method for manufacturing the mask, and a method for manufacturing a microstructure using a LIGA process. The method for manufacturing the microstructure using the LIGA process contemplates forming a substrate for the microstructure, a plurality of photosensitive layers, each photosensitive layer having a plating hole and an aligning pinhole, and an aligning pin capable of being inserted into the aligning pinhole, with the aligning pinholes of the photosensitive layers being formed in corresponding positions, and repeating a process of stacking the photosensitive layer on the substrate for the microstructure and a process of forming a plating layer by plating the plating hole of the stacked photosensitive layer with a metal for a number of times corresponding to the number of the photosensitive layers, and when the photosensitive layers are stacked on the substrate for the structure, the photosensitive layers being aligned with one another by inserting the aligning pin into the aligning pinholes of all the photosensitive layers stacked on the substrate for the microstructure to penetrate all the photosensitive layers.

REFERENCES:
patent: 5378583 (1995-01-01), Guckel et al.
patent: 5908719 (1999-06-01), Guckel et al.

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