Adhesive bonding and miscellaneous chemical manufacture – Differential fluid etching apparatus – With workpiece support
Reexamination Certificate
2011-08-23
2011-08-23
Gramaglia, Maureen (Department: 1716)
Adhesive bonding and miscellaneous chemical manufacture
Differential fluid etching apparatus
With workpiece support
C118S7230AN
Reexamination Certificate
active
08002946
ABSTRACT:
A plasma reactor for etching a workpiece such as a rectangular or square mask, includes a vacuum chamber having a ceiling and a sidewall and a workpiece support pedestal within the chamber including a cathode having a surface for supporting a workpiece, the surface comprising plural respective zones, the respective zones of the surface being formed of respective materials of different electrical characteristics. The zones can be arranged concentrically relative to an axis of symmetry of the wafer support pedestal.
REFERENCES:
patent: 4558845 (1985-12-01), Hunkapiller
patent: 5074456 (1991-12-01), Degner et al.
patent: 5083590 (1992-01-01), Gattolliat et al.
patent: 5280154 (1994-01-01), Cuomo et al.
patent: 5419924 (1995-05-01), Nagashima et al.
patent: 5522934 (1996-06-01), Suzuki et al.
patent: 5534231 (1996-07-01), Savas
patent: 5620523 (1997-04-01), Maeda et al.
patent: 5658418 (1997-08-01), Coronel et al.
patent: 5717294 (1998-02-01), Sakai et al.
patent: 5724144 (1998-03-01), Muller et al.
patent: 5772771 (1998-06-01), Li et al.
patent: 5866198 (1999-02-01), Sato et al.
patent: 5876119 (1999-03-01), Ishikawa et al.
patent: 5879128 (1999-03-01), Tietz et al.
patent: 5948168 (1999-09-01), Shan et al.
patent: 6217937 (2001-04-01), Shealy
patent: 6228438 (2001-05-01), Schmitt
patent: 6239403 (2001-05-01), Dible et al.
patent: 6263829 (2001-07-01), Schneider et al.
patent: 6353210 (2002-03-01), Norrbakhsh et al.
patent: 6363882 (2002-04-01), Hao et al.
patent: 6388382 (2002-05-01), Doi et al.
patent: 6412437 (2002-07-01), Campbell et al.
patent: 6413867 (2002-07-01), Sarfaty et al.
patent: 6449871 (2002-09-01), Kholodenko et al.
patent: 6458495 (2002-10-01), Tsai et al.
patent: 6557593 (2003-05-01), Siegele et al.
patent: 6806653 (2004-10-01), Strang et al.
patent: 6829056 (2004-12-01), Barnes et al.
patent: 6896737 (2005-05-01), Sandhu
patent: 6961131 (2005-11-01), Usui et al.
patent: 7271096 (2007-09-01), Sandhu
patent: 7291545 (2007-11-01), Collins
patent: 7537672 (2009-05-01), Koshiishi et al.
patent: 2001/0054483 (2001-12-01), Collins et al.
patent: 2002/0000198 (2002-01-01), Ishikawa et al.
patent: 2002/0009814 (2002-01-01), Usui et al.
patent: 2002/0101167 (2002-08-01), Shan et al.
patent: 2002/0146512 (2002-10-01), Rossman
patent: 2002/0192369 (2002-12-01), Morimoto et al.
patent: 2003/0005958 (2003-01-01), Rocha-Alvarez et al.
patent: 2003/0029564 (2003-02-01), Brown et al.
patent: 2003/0070620 (2003-04-01), Cooperberg et al.
patent: 2003/0124820 (2003-07-01), Johnsgard et al.
patent: 2003/0129835 (2003-07-01), Kholodenko et al.
patent: 2003/0137250 (2003-07-01), Mitrovic
patent: 2003/0141795 (2003-07-01), Strang et al.
patent: 2003/0155079 (2003-08-01), Bailey et al.
patent: 2003/0176000 (2003-09-01), Otsubo et al.
patent: 2004/0025787 (2004-02-01), Selbrede et al.
patent: 2004/0062874 (2004-04-01), Kim et al.
patent: 2004/0108068 (2004-06-01), Senzaki et al.
patent: 2004/0261712 (2004-12-01), Hayashi et al.
patent: 2005/0051271 (2005-03-01), Collins et al.
patent: 2005/0082007 (2005-04-01), Nguyen et al.
patent: 2005/0095776 (2005-05-01), Usuami
patent: 2005/0241583 (2005-11-01), Buechel et al.
patent: 2005/0263247 (2005-12-01), Samukawa et al.
patent: 2006/0043067 (2006-03-01), Kadkhodayan et al.
patent: 2006/0073683 (2006-04-01), Collins et al.
patent: 2006/0191638 (2006-08-01), Dalton et al.
patent: 2006/0219362 (2006-10-01), Han et al.
patent: 2007/0048869 (2007-03-01), Lee et al.
patent: 2007/0075037 (2007-04-01), Chang et al.
patent: 2007/0166477 (2007-07-01), Chang
patent: 2008/0100223 (2008-05-01), Lewington et al.
patent: 051360981 (1993-06-01), None
patent: 2000200783 (2000-07-01), None
patent: 100147634 (1998-05-01), None
patent: WO9702589 (1997-01-01), None
patent: WO0150497 (2001-07-01), None
Official Communication Dated Jan. 6, 2010 Issued in Co-Pending U.S. Appl. No. 11/589,598.
Official Communication Dated Aug. 31, 2009 in Co-Pending U.S. Appl. No. 11/589,652.
Official Communication Dated Sep. 21, 2009 in Co-Pending U.S. Appl. No. 11/589,598.
Official Communication Dated Sep. 24, 2009 in Co-Pending U.S. Appl. No. 11/589,577.
Official Communication Dated Oct. 30, 2009 in Co-Pending U.S. Appl. No. 11/589,343.
Official Communication Dated Nov. 5, 2009 in Co-Pending U.S. Appl. No. 11/589,426.
Official Action Dated Apr. 23, 2010 Issued in Co-Pending U.S. Appl. No. 11/589,476.
Official Action Dated Apr. 26, 2010 Issued in Co-Pending U.S. Appl. No. 11/589,343.
Official Action Dated May 11, 2010 Issued in Co-Pending U.S. Appl. No. 11/589,426.
Official Action Dated May 18, 2010 Issued in Co-Pending U.S. Appl. No. 11/589,598.
Official Action Dated May 19, 2010 Issued in Co-Pending U.S. Appl. No. 11/589,476.
Official Action Dated May 27, 2010 Issued in Co-Pending U.S. Appl. No. 11/589,596.
Official Action Dated Jun. 22, 2010 Issued in Co-Pending U.S. Appl. No. 11/589,652.
Official Action Dated Jun. 23, 2010 Issued in Co-Pending U.S. Appl. No. 11/589,477.
European Search Report Dated May 27, 2010 Issued in Corresponding European Patent Application No. 07014341.7-1226.
Official Action Dated Aug. 4, 2010 Issued in Co-Pending U.S. Appl. No. 11/589,596.
Official Action Dated Sep. 14, 2010 Issued in Co-Pending U.S. Appl. No. 11/589,426.
Official Action Dated Dec. 7, 2010 Issued in Co-Pending U.S. Appl. No. 11/589,652.
Official Action Dated Dec. 8, 2010 Issued in Co-Pending U.S. Appl. No. 11/589,343.
Official Action Dated Dec. 9, 2010 Issued in Co-Pending U.S. Appl. No. 11/589,477.
Official Action Dated Dec. 10, 2010 Issued in Co-Pending U.S. Appl. No. 11/589,337.
Official Action Dated Jan. 18, 2011 Issued in Co-Pending U.S. Appl. No. 11/589,426.
Official Action Dated Mar. 14, 2011 Issued in Co-Pending U.S. Appl. No. 11/589,477.
Official Action Dated Mar. 14, 2011 Issued in Co-Pending U.S. Appl. No. 11/589,652.
Official Action Dated Mar. 29, 2011 Issued in Co-Pending U.S. Appl. No. 11/589,598.
Official Action Dated Mar. 30, 2011 Issued in Co-Pending U.S. Appl. No. 11/589,476.
Official Action Dated Apr. 14, 2011 Issued in Co-Pending U.S. Appl. No. 11/589,596.
Official Action Dated Apr. 20, 2011 Issued in Co-Pending Patent U.S. Appl. No. 11/589,343.
Official Action Dated May 11, 2011 Issued in Co-Pending U.S. Appl. No. 11/589,426.
Bivens Darin
Chandrachood Madhavi R.
Grimbergen Michael N.
Kumar Ajay
Lewington Richard
Applied Materials Inc.
Gramaglia Maureen
Wallace Robert M.
LandOfFree
Mask etch plasma reactor with cathode providing a uniform... does not yet have a rating. At this time, there are no reviews or comments for this patent.
If you have personal experience with Mask etch plasma reactor with cathode providing a uniform..., we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Mask etch plasma reactor with cathode providing a uniform... will most certainly appreciate the feedback.
Profile ID: LFUS-PAI-O-2714415