Magnetron having continuously variable radial position

Details Magnetron having continuously variable radial position Magnetron having continuously variable radial position

2005-09-14

2010-06-15

McDonald, Rodney G (Department: 1795)

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

C204S192170, C204S298200

Reexamination Certificate

active

07736473

ABSTRACT:
A continuously variable multi-position magnetron that is rotated about a central axis in back of a sputtering target at a freely selected radius. The position is dynamically controlled from the outside, for example, through a hydraulic actuator connected between a pivoting arm supporting the magnetron and an arm fixed to the shaft, by two coaxial shafts independent controllable from the outside and supporting the magnetron through a frog-leg mechanism, or a cable connected between the pivoting arms and moved by an external slider. The magnetron can be rotated at two, three, or more discrete radii or be moved in a continuous spiral pattern.

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Translation of Fu et al. JP 11-074225 dated Mar. 1999.

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