Magnetic enhancement for mechanical confinement of plasma

Details Magnetic enhancement for mechanical confinement of plasma Magnetic enhancement for mechanical confinement of plasma

2008-10-16

2010-11-23

Meeks, Timothy H (Department: 1715)

Coating processes

Direct application of electrical, magnetic, wave, or...

Plasma

C427S569000, C118S7230ER

Reexamination Certificate

active

07838086

ABSTRACT:
A method for processing a substrate is provided. The substrate is placed in a process chamber. A gas is provided from a gas source to the process chamber. A plasma is generated from the gas in the process chamber. The gas flows through a gap adjacent to at least one confinement ring to provide physical confinement of the plasma. Magnetic confinement of the plasma is provided to enhance the physical confinement of the plasma.

REFERENCES:
patent: 6019060 (2000-02-01), Lenz
patent: 6051151 (2000-04-01), Keller et al.
patent: 6074518 (2000-06-01), Imafuku et al.
patent: 6085688 (2000-07-01), Lymberopoulos et al.
patent: 6872281 (2005-03-01), Chen et al.
patent: 2003/0010454 (2003-01-01), Bailey, III et al.
patent: 61-128527 (1986-06-01), None
patent: 62-069621 (1987-03-01), None
patent: WO 02/27755 (2002-04-01), None
patent: 03/003403 (2003-01-01), None
International Search Report dated Feb. 8, 2005 from International Application No. PCT/US2004/018557.
Austrian Examination Report dated Nov. 15, 2007 from Singapore Patent Application No. 200507909-0.
Office Action dated Aug. 7, 2009 from Chinese Application No. 200480023920.X.
Office Action dated Feb. 5, 2010 from Chinese Application No. 200480023920.X.
Office Action dated Jun. 29, 2010 from Chinese Application No. 200480023920.X.
Office Action dated Jul. 6, 2010 from Japanese Application No. 2006-517222.

Affiliated with

Also associated with

Rating

Magnetic enhancement for mechanical confinement of plasma does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Magnetic enhancement for mechanical confinement of plasma, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Magnetic enhancement for mechanical confinement of plasma will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-4186241