Magnetic enhancement for mechanical confinement of plasma

Details Magnetic enhancement for mechanical confinement of plasma Magnetic enhancement for mechanical confinement of plasma

2003-06-20

2008-11-25

Hassanzadeh, Parviz (Department: 1792)

Adhesive bonding and miscellaneous chemical manufacture

Differential fluid etching apparatus

Having glow discharge electrode gas energizing means

C118S7230ER

Reexamination Certificate

active

07455748

ABSTRACT:
A plasma processing apparatus for processing a substrate is provided. A plasma processing chamber with chamber walls is provided. A substrate support is provided within the chamber walls. At least one confinement ring is provided, where the confinement ring and the substrate support define a plasma volume. A magnetic source for generating a magnetic field for magnetically enhancing physical confinement provided by the at least one confinement ring is provided.

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International Search Report, dated Feb. 8, 2005.
Austrian Examination Report dated Nov. 15, 2007 for related Singapore Patent Application No. 200507909-0.

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