Semiconductor device manufacturing: process – Chemical etching
Patent
1997-06-05
1998-08-04
Breneman, R. Bruce
Semiconductor device manufacturing: process
Chemical etching
438758, 156345, 118723R, 118715, 20429807, 20429811, 20429833, C23C 1600, H01L 2100
Patent
active
057893225
ABSTRACT:
An improved low-volume gas distribution assembly for a chemical downstream etch tool includes a focusing collar positioned within a process chamber and having a depending shroud in close proximity to a wafer chuck. An apertured gas delivery conduit rests on channels formed in slanted sides of a central tube of the focusing collar. The apertures in the gas delivery conduit are patterned and dimensioned to provide substantially uniform distribution of a process gas over the upper surface of the workpiece. The central tube is sealed with a cover plate and the process chamber is covered with a chamber lid.
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Brown William
Herchen Harald
Merry Walter
Nzeadibe Ihi
Alejandro Luz
Applied Materials Inc.
Breneman R. Bruce
Glenn Michael A.
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