4. Coating apparatus
  5. Condition responsive control

Ihi Nzeadibe

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Low volume gas distribution assembly and method for a chemical d

Adhesive bonding and miscellaneous chemical manufacture – Delaminating processes adapted for specified product – Delaminating in preparation for post processing recycling step
Patent

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Low volume gas distribution assembly for a chemical downstream e

Semiconductor device manufacturing: process – Chemical etching
Patent

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Semiconductor process chamber and processing method

Coating apparatus – Condition responsive control
Patent

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Substrate process chamber and processing method

Etching a substrate: processes – Gas phase etching of substrate – With measuring – testing – or inspecting
Reexamination Certificate

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Profile ID: LFUS-PAI-P-386233

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