Optical: systems and elements – Lens – With field curvature shaping
Reexamination Certificate
2004-07-14
2009-06-23
Collins, Darryl J (Department: 2873)
Optical: systems and elements
Lens
With field curvature shaping
Reexamination Certificate
active
07551361
ABSTRACT:
An optical imaging system for a microlithography projection exposure system is used for imaging an object field arranged in an object plane of the imaging system into an image field arranged in an image plane of the imaging system. A projection objective or a relay objective to be used in the illumination system can be involved, in particular. The imaging system has a plurality of lenses that are arranged between the object plane and the image plane and in each case have a first lens surface and a second lens surface. At least one of the lenses is a double aspheric lens where the first lens surface and the second lens surface is an aspheric surface. Lenses of good quality that have the action of an asphere with very strong deformation can be produced in the case of double aspheric lenses with an acceptable outlay as regards the surface processing and testing of the lens surfaces.
REFERENCES:
patent: 4906080 (1990-03-01), Omata
patent: 5969882 (1999-10-01), Takahashi
patent: 6104472 (2000-08-01), Suzuki
patent: 6366410 (2002-04-01), Schultz et al.
patent: 6486940 (2002-11-01), Williamson
patent: 6646718 (2003-11-01), Schuster et al.
patent: 6707616 (2004-03-01), Takahashi et al.
patent: 2002/0039175 (2002-04-01), Shafer et al.
patent: 2002/0171944 (2002-11-01), Suenaga et al.
patent: 2003/0002172 (2003-01-01), Ohtake et al.
patent: 2003/0030916 (2003-02-01), Suenaga
patent: 2003/0048547 (2003-03-01), Schuster
patent: 2003/0179356 (2003-09-01), Schuster et al.
patent: 196 53 983 (1998-06-01), None
patent: 100 02 626 (2001-07-01), None
patent: 0 851 304 (1998-07-01), None
patent: 0 869 383 (1998-10-01), None
patent: 1 061 396 (2000-12-01), None
patent: 1 079 253 (2001-02-01), None
patent: 1 174 749 (2002-01-01), None
patent: 1 316 832 (2003-06-01), None
patent: 1 242 843 (2006-03-01), None
patent: WO 99/52004 (1999-10-01), None
patent: WO 01/50171 (2001-07-01), None
patent: WO 02/12924 (2002-02-01), None
patent: WO 02/052346 (2002-07-01), None
patent: WO 03/077036 (2003-09-01), None
Dodoc Aurelian
Epple Alexander
Rostalski Hans-Juergen
Schultz Joerg
Schuster Karl-Heinz
Carl Zeiss SMT AG
Collins Darryl J
Sughrue & Mion, PLLC
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