Linear drive system for use in a plasma processing system

Details Linear drive system for use in a plasma processing system Linear drive system for use in a plasma processing system

2005-03-08

2005-03-08

VerSteeg, Steven (Department: 1753)

Chemistry: electrical and wave energy

Processes and products

Coating, forming or etching by sputtering

C427S008000, C427S569000, C216S071000

Reexamination Certificate

active

06863784

ABSTRACT:
A plasma processing system for processing a substrate is disclosed. The system includes a process component capable of effecting a plasma inside a process chamber. The system also includes a gear drive assembly for moving the process component in a linear direction during processing of the substrate.

REFERENCES:
patent: 4379743 (1983-04-01), Nakatsukasa et al.
patent: 4478701 (1984-10-01), Welch et al.
patent: 4797054 (1989-01-01), Aril
patent: 4851095 (1989-07-01), Scobey et al.
patent: 4944860 (1990-07-01), Bramhall, Jr. et al.
patent: 5110437 (1992-05-01), Yamada et al.
patent: 5178739 (1993-01-01), Barnes et al.
patent: 5284561 (1994-02-01), Shinnerman et al.
patent: 5354413 (1994-10-01), Smesney et al.
patent: 5534751 (1996-07-01), Lenz et al.
patent: 5552124 (1996-09-01), Su
patent: 5651867 (1997-07-01), Kokaku et al.
patent: 5672882 (1997-09-01), Day et al.
patent: 5730847 (1998-03-01), Hanaguri et al.
patent: 5889248 (1999-03-01), Plettner et al.
patent: 5961798 (1999-10-01), Robinson et al.
patent: 6019060 (2000-02-01), Lenz
patent: 6350317 (2002-02-01), Hao et al.
patent: 9967807 (1999-12-01), None

Affiliated with

Also associated with

Rating

Linear drive system for use in a plasma processing system does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Linear drive system for use in a plasma processing system, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Linear drive system for use in a plasma processing system will most certainly appreciate the feedback.

Rate now

Comments { 0 }

Profile ID: LFUS-PAI-O-3426905