Ion implantation having increased source lifetime

Details Ion implantation having increased source lifetime Ion implantation having increased source lifetime

1993-08-11

1996-05-14

Snow, Walter E.

Electric lamp and discharge devices

With positive or negative ion acceleration

31323141, 31323171, 313341, 313240, 313333, 31511181, 250426, 250423R, H01J 2708, H05H 148

Patent

active

055170773

ABSTRACT:
Ion implantation equipment is modified so as to provide filament reflectors to a filament inside of an arc chamber, and to remove the electrical insulators for the filament outside of the arc chamber and providing a means of shielding, thereby reducing the formation of a conductive layer on said insulators and greatly extending the lifetime and reducing downtime of the equipment. The efficiency of the equipment is further enhanced by means of an interchangeable liner for the arc chamber that increases the wall temperature of the arc chamber and thus the electron temperature. The use of tungsten parts inside the arc chamber, obtained either by making the arc chamber itself or portions thereof of tungsten, particularly the front plate having the exit aperture for the ion beam, or by inserting a removable tungsten liner therein, decreases contamination of the ion beam. Serviceability of the arc chamber is improved by means of a unitary clamp that separately grips both the filament and filament reflectors. This clamp can also advantageously be made of tungsten.

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