Ion beam processing apparatus and method of correcting mask defe

Details Ion beam processing apparatus and method of correcting mask defe Ion beam processing apparatus and method of correcting mask defe

1982-09-29

1985-03-05

Anderson, Bruce C.

Radiant energy

Inspection of solids or liquids by charged particles

Positive ion probe or microscope type

2504922, G01N 2300

Patent

active

045033293

ABSTRACT:
Disclosed is an ion beam processing apparatus comprising within a vacuum container a specimen chamber with a table for mounting a specimen provided therein, a high intensity ion source, such as a liquid metal ion source or an electric field ionizing ion source which operates in ultra-low temperature, confronting the specimen chamber, an extraction electrode for extracting an ion beam out of the ion source, a charged-particle optical system for focusing the ion beam to a spot, and an aperture for adjusting the spot diameter.

REFERENCES:
patent: 3889115 (1975-06-01), Tamura et al.
patent: 4063091 (1977-12-01), Gee
patent: 4085330 (1978-04-01), Wolfe
patent: 4361762 (1982-11-01), Douglas
"A High-Intensity Scanning Ion Probe with Submicrometer Spot Size", Seliger et al., Appl. Phy. Lett., 34 (5), Mar. 1979, pp. 310-312.

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