Inspection apparatus for circuit pattern

Details Inspection apparatus for circuit pattern Inspection apparatus for circuit pattern

2007-05-29

2007-05-29

Wells, Nikita (Department: 2881)

Radiant energy

Inspection of solids or liquids by charged particles

Electron probe type

Reexamination Certificate

active

10843642

ABSTRACT:
In a circuit pattern inspection apparatus, while an electron beam is irradiated onto a surface of a substrate having a plurality of chips where circuit patterns have been formed, a signal produced from the irradiated substrate is detected so as to form an image, and then, the formed image is compared with another image in order to detect a defect on the circuit patterns. Before the electron beam is irradiated onto either the chip or the plurality of chips so as to acquire the image for an inspection purpose, an electron beam is previously irradiated onto the region to be irradiated, so that charging conditions of the substrate to be inspected are arbitrarily controlled.

REFERENCES:
patent: 5502306 (1996-03-01), Meisburger et al.
patent: 6421122 (2002-07-01), Nara et al.
patent: 6493082 (2002-12-01), Nara et al.
patent: 6627884 (2003-09-01), McCord et al.
patent: 5-258703 (1993-10-01), None
patent: 2000-193594 (2004-07-01), None

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