Inductively-driven light source for microscopy

Electric lamp and discharge devices: systems – Discharge device load with fluent material supply to the... – Plasma generating

Reexamination Certificate

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

C250S50400H

Reexamination Certificate

active

10888434

ABSTRACT:
An apparatus for producing light includes a chamber that has a plasma discharge region and that contains an ionizable medium. The apparatus also includes a magnetic core that surrounds a portion of the plasma discharge region. The apparatus also includes a pulse power system for providing at least one pulse of energy to the magnetic core for delivering power to a plasma formed in the plasma discharge region. The plasma has a localized high intensity zone.

REFERENCES:
patent: 4042848 (1977-08-01), Lee
patent: 5821705 (1998-10-01), Caporaso et al.
patent: 6150628 (2000-11-01), Smith et al.
patent: 6359969 (2002-03-01), Shmaenok
patent: 6388226 (2002-05-01), Smith et al.
patent: 6421421 (2002-07-01), McGeoch
patent: 6486431 (2002-11-01), Smith et al.
patent: 6541786 (2003-04-01), Partlo et al.
patent: 6552296 (2003-04-01), Smith et al.
patent: 6559408 (2003-05-01), Smith et al.
patent: 6566668 (2003-05-01), Rauch et al.
patent: 6678037 (2004-01-01), Van Elp et al.
patent: 6804327 (2004-10-01), Schriever et al.
patent: 6815700 (2004-11-01), Melnychuk et al.
patent: 6826451 (2004-11-01), del Puerto et al.
patent: 6838684 (2005-01-01), Bakker et al.
patent: 6881971 (2005-04-01), Ahmad
patent: 6894298 (2005-05-01), Ahmad et al.
patent: 2002/0101167 (2002-08-01), Shan et al.
patent: 2002/0154279 (2002-10-01), Koster et al.
patent: 2002/0163313 (2002-11-01), Ness et al.
patent: 2002/0167282 (2002-11-01), Kirkpatrick et al.
patent: 2002/0186814 (2002-12-01), McGeoch
patent: 2002/0186815 (2002-12-01), McGeoch
patent: 2003/0006383 (2003-01-01), Melnychuk et al.
patent: 2003/0057877 (2003-03-01), Kurachi et al.
patent: 2003/0068012 (2003-04-01), Ahmad et al.
patent: 2003/0222557 (2003-12-01), Kurachi et al.
patent: 2004/0036423 (2004-02-01), Lezcano et al.
patent: 2004/0108473 (2004-06-01), Melnychuk et al.
patent: 56125882 (1981-02-01), None
patent: WO 90/13136 (1990-11-01), None
Atwood, EUV Source Candidates for Clean, Collectable 13-14 nm Wavelength Radiation, class illustrations for Chapter 6 of Soft X-rays and Extreme Ultraviolet Radiation: Principles and Applications,Course AST210, US Berkely, (Jan. 2004).
Kandlikar, “Heat Transfer Characteristics in Partial Boiling, Fully Developed Boiling, and Significant Void Flow Regions of Subcooled Flow Boiling,”Journal of Heat Transfer(Feb. 2, 1998) pp. 1-7.
Kaneda et al., “Plasma parameters in noble-gas narrow-tube and capillary-tube discharge, positive column plasma,”J. Phys. D: Appl. Phys, vol. 23 (1990) pp. 500-503.
Kapteyn, “Compact Coherent EUV Sources”, presented at Workshop for users of the Proposed Argonne Linear Free-electron Laser Facility (ALFF),Argonne National Laboratory, Argonne, IL (Oct. 30-31, 2003).
Lebert et al., “A gas discharged based radiation source for EUV-lithography,”Microelectronic Engineering, vol. 46 (1999) pp. 449-452.
Liberman, et al.,Physics of High-Density Z-Pinch Plasmas, Springer-Verlag, New York, (1999) pp. 1-277.
McGeoch, “Progress on the Astron EUV Source,” presented at the International SEMATECH 2001 Next Generation Lithography Workshop (Aug. 29, 2001) pp. 1-9.
Mohanty et al., “A novel fast capillary discharge system emitting intense EUV radiation,”Microelectronic Engineering, vol. 65 (2003) pp. 47-59.
O'Sullivan et al., “Spectroscopy of a 13.5 nm Laser Plasma Source”International SEMATECH EUVL Source Workshop(Oct. 2002) pp. 1-31.
Pouvesle et al., “Discharge-based sources of XUV-X radiations: development and applications,”Plasma Sources Science and Technologyvol. 12 (2003) pp. S43-S50.
Teramoto et al., “High repetition rate MPC generator-driven capillary Z-pinch EUV source,” SPIE 29thAnnual International Symposium on Microlithography, Santa Clara, CA (Feb. 22-27, 2004) pp. 1-23.
Teramoto et al., “Radiation Characteristics of a Capillary Z-Pinch EUV Source,” 2ndInternational EUVL Symposium, Antwerp, Belgium (Sep. 30-Oct. 2, 2003) pp. 1-18.
Wheeler et al., “The high-power constricted plasma discharge col. I. Theoretical analysis,”J. Phys. D: Appl. Phys. vol. 3 (1970) pp. 1374-1380.
Wheeler, “The high-power constricted plasma discharge col. II. Experimental investigation,”J. Phys. D: Appl. Phys. vol. 4 (1971) pp. 400-408.
Invitation to Pay Additional Fees (Form PCT/ISA/206) for PCT/US2005/024095 (Dec. 21, 2005).
F. Inasaka et al., “Critical heat flux multiplier of subcooled flow boiling for non-uniform heating conditions in a swirl tube,”Fusion Engineering and Design, vol. 28, 1995, pp. 53-58.
A. Hassanein et al., “Candidate Plasma-Facing Materials for EUV Lithography Source Components,”Emerging Lithographic Technologies VII, Proceedings of the SPIE, vol. 5037, 2003, pp. 358-369.
M. McGeoch et al., “Star Pinch Scalable EUV Source,”Emerging Lithographic Technologies VII, Proceedings of the SPIE, vol. 5037, 2003, pp. 141-146.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Inductively-driven light source for microscopy does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Inductively-driven light source for microscopy, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Inductively-driven light source for microscopy will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-3871584

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.