In-situ dose monitoring using optical emission spectroscopy

Details In-situ dose monitoring using optical emission spectroscopy In-situ dose monitoring using optical emission spectroscopy

2011-01-18

2011-01-18

Landau, Matthew C (Department: 2813)

Semiconductor device manufacturing: process

Including control responsive to sensed condition

Optical characteristic sensed

C257SE21528, C438S016000

Reexamination Certificate

active

07871828

ABSTRACT:
The present invention generally provides methods and apparatus for monitoring ion dosage during a plasma process. One embodiment of the present invention provides a method for processing a substrate comprising generating a correlation between the at least one attribute of optical emissions of the plasma and a dosage quantity. In one embodiment, the attribute of optical emissions of the plasma is optical emission intensity of an ion species in the plasma.

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