Immersion lithography methods using carbon dioxide

Details Immersion lithography methods using carbon dioxide Immersion lithography methods using carbon dioxide

2006-04-18

2006-04-18

Duda, Kathleen (Department: 1756)

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Forming nonplanar surface

C430S311000

Reexamination Certificate

active

07029832

ABSTRACT:
A substrate is patterned by performing immersion lithography on a photoresist layer on the substrate using carbon dioxide. The immersion layer may be provided and/or removed and/or the photoresist layer may be developed, dried and/or removed using carbon dioxide. The immersion layer can include liquid and/or solid immersion layers. The need for organic solvents in immersion lithography can thereby be reduced or eliminated.

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