Illumination system particularly for microlithography

Details Illumination system particularly for microlithography Illumination system particularly for microlithography

2006-02-28

2006-02-28

Ho, Allen C. (Department: 2882)

X-ray or gamma ray systems or devices

Specific application

Lithography

C378S085000, C250S492200, C355S053000, C355S067000

Reexamination Certificate

active

07006595

ABSTRACT:
There is provided an illumination system for scannertype microlithography along a scanning direction with a light source emitting a wavelength ≦193 nm. The illumination system includes a plurality of raster elements. The plurality of raster elements is imaged into an image plane of the illumination system to produce a plurality of images being partially superimposed on a field in the image plane. The field defines a non-rectangular intensity profile in the scanning direction.

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