Semiconductor device manufacturing: process – Making field effect device having pair of active regions... – Having insulated gate
Patent
1996-11-13
1998-12-01
Trinh, Michael
Semiconductor device manufacturing: process
Making field effect device having pair of active regions...
Having insulated gate
438133, 438210, 438238, 438307, H01L 218238
Patent
active
058438130
ABSTRACT:
VLSI I/O structures to reduce the effects of simultaneous switching noise (SSN) on output driver circuits and enhance electrostatic discharge immunity, while reducing chip area, in both input receiver circuits and output driver circuits include improved transistors having deep-junction drain and a multi-cascaded, resistive deep-junction source structure.
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Bach Randall E.
Colwell Michael
Wei Hua-Fang
LSI Logic Corporation
Trinh Michael
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