Hybrid Johnsen-Rahbek electrostatic chuck having highly resistiv

Electricity: electrical systems and devices – Electric charge generating or conducting means – Use of forces of electric charge or field

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279128, H02N13/00

Patent

active

059034289

ABSTRACT:
A hybrid Johnsen-Rahbek chuck that provides a combination of both Coulombic and Johnsen-Rahbek chucking mechanisms. More specifically, the chuck contains a plurality of dielectric mesas deposited upon particular regions of the support surface of a chuck. The body of the chuck is generally fabricated from a Johnsen-Rahbek semiconducting dielectric. The mesas are formed from a thin film deposition of a highly-resistive dielectric. Consequently, the thin, highly resistive film prevents excess DC standby current as well as reduces the dependence of the electrostatic chuck performance on the wafer backside morphology and composition.

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patent: 5656093 (1997-08-01), Burkhart et al.

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