Highly sensitive dry developable deep UV photoresist

Details Highly sensitive dry developable deep UV photoresist Highly sensitive dry developable deep UV photoresist

1989-10-23

1991-06-11

McCamish, Marion E.

Radiation imagery chemistry: process, composition, or product th

Imaging affecting physical property of radiation sensitive...

Radiation sensitive composition or product or process of making

430311, 430326, G03C 1735, G03F 7039

Patent

active

050231642

ABSTRACT:
Highly sensitive, highly absorbing deep ultraviolet and vacuum ultraviolet resists which comprise a novolak resin protected with an acid labile group and a photoinitiator which generates a strong acid upon exposure to deep ultraviolet or vacuum ultraviolet radiation. The exposed resists are reacted with organometallic compounds to form reactive ion etch resistant patterns.

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