Highly sensitive dry developable deep UV photoresist

Radiation imagery chemistry: process – composition – or product th – Imaging affecting physical property of radiation sensitive... – Radiation sensitive composition or product or process of making

Patent

Rate now

  [ 0.00 ] – not rated yet Voters 0   Comments 0

Details

430311, 430326, G03C 1735, G03F 7039

Patent

active

050231642

ABSTRACT:
Highly sensitive, highly absorbing deep ultraviolet and vacuum ultraviolet resists which comprise a novolak resin protected with an acid labile group and a photoinitiator which generates a strong acid upon exposure to deep ultraviolet or vacuum ultraviolet radiation. The exposed resists are reacted with organometallic compounds to form reactive ion etch resistant patterns.

REFERENCES:
patent: 4404272 (1983-09-01), Stahlhofen
patent: 4491628 (1985-01-01), Ito et al.
patent: 4500628 (1985-02-01), Taylor
patent: 4552838 (1985-11-01), Ito et al.
patent: 4564575 (1986-01-01), Perreault et al.
patent: 4681923 (1987-07-01), Demmer et al.
patent: 4708925 (1987-11-01), Newman
patent: 4810601 (1989-03-01), Allen et al.
patent: 4810613 (1989-03-01), Osuch et al.
patent: 4837121 (1989-06-01), Blakeney et al.
patent: 4931379 (1990-06-01), Brunsvold et al.
patent: 4939070 (1990-07-01), Brunsvold et al.
patent: 4980264 (1990-12-01), Chiong et al.

LandOfFree

Say what you really think

Search LandOfFree.com for the USA inventors and patents. Rate them and share your experience with other people.

Rating

Highly sensitive dry developable deep UV photoresist does not yet have a rating. At this time, there are no reviews or comments for this patent.

If you have personal experience with Highly sensitive dry developable deep UV photoresist, we encourage you to share that experience with our LandOfFree.com community. Your opinion is very important and Highly sensitive dry developable deep UV photoresist will most certainly appreciate the feedback.

Rate now

     

Profile ID: LFUS-PAI-O-782237

  Search
All data on this website is collected from public sources. Our data reflects the most accurate information available at the time of publication.