High efficiency UV curing system

Radiant energy – Supported for nonsignalling objects of irradiation – With source support

Reexamination Certificate

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C250S50400H, C250S453110

Reexamination Certificate

active

07663121

ABSTRACT:
An ultraviolet (UV) cure chamber enables curing a dielectric material disposed on a substrate and in situ cleaning thereof. A tandem process chamber provides two separate and adjacent process regions defined by a body covered with a lid having windows aligned respectively above each process region. One or more UV bulbs per process region that are covered by housings coupled to the lid emit UV light directed through the windows onto substrates located within the process regions. The UV bulbs can be an array of light emitting diodes or bulbs utilizing a source such as microwave or radio frequency. The UV light can be pulsed during a cure process. Using oxygen radical/ozone generated remotely and/or in-situ accomplishes cleaning of the chamber. Use of lamp arrays, relative motion of the substrate and lamp head, and real-time modification of lamp reflector shape and/or position can enhance uniformity of substrate illumination.

REFERENCES:
patent: 3983039 (1976-09-01), Eastland
patent: 4135098 (1979-01-01), Troue
patent: 4411931 (1983-10-01), Duong
patent: 4849640 (1989-07-01), Kruishoop
patent: 4911103 (1990-03-01), Davis et al.
patent: 5136170 (1992-08-01), Gellert
patent: 5228206 (1993-07-01), Grant et al.
patent: 5422488 (1995-06-01), Baier et al.
patent: 5440137 (1995-08-01), Sowers
patent: 5705232 (1998-01-01), Hwang et al.
patent: 5722761 (1998-03-01), Knight
patent: 5812403 (1998-09-01), Fong et al.
patent: 5885751 (1999-03-01), Weidman et al.
patent: 5909994 (1999-06-01), Blum et al.
patent: 5973331 (1999-10-01), Stevens et al.
patent: 6013330 (2000-01-01), Lutz
patent: 6054379 (2000-04-01), Yau et al.
patent: 6098637 (2000-08-01), Parke
patent: 6178973 (2001-01-01), Franca et al.
patent: 6201219 (2001-03-01), Sandhu et al.
patent: 6224934 (2001-05-01), Hasei et al.
patent: 6225745 (2001-05-01), Srivastava
patent: 6238844 (2001-05-01), Joubert et al.
patent: 6259072 (2001-07-01), Kinnard et al.
patent: 6264802 (2001-07-01), Kamrukov et al.
patent: 6265830 (2001-07-01), Bretmersky et al.
patent: 6284050 (2001-09-01), Shi et al.
patent: 6319809 (2001-11-01), Chang et al.
patent: 6323601 (2001-11-01), Klein et al.
patent: 6331480 (2001-12-01), Tsai et al.
patent: 6380270 (2002-04-01), Yates
patent: 6406836 (2002-06-01), Mohondro et al.
patent: 6457846 (2002-10-01), Cook et al.
patent: 6458430 (2002-10-01), Bernstein et al.
patent: 6475930 (2002-11-01), Junker et al.
patent: 6503693 (2003-01-01), Mohondro et al.
patent: 6524936 (2003-02-01), Hallock et al.
patent: 6559460 (2003-05-01), Keogh et al.
patent: 6566278 (2003-05-01), Harvey et al.
patent: 6582891 (2003-06-01), Hallock et al.
patent: 6585908 (2003-07-01), Cardoso et al.
patent: 6589715 (2003-07-01), Joubert et al.
patent: 6591850 (2003-07-01), Rocha-Alvarez et al.
patent: 6593699 (2003-07-01), Lagos
patent: 6597003 (2003-07-01), Janos et al.
patent: 6605484 (2003-08-01), Janos et al.
patent: 6610169 (2003-08-01), Nguyen et al.
patent: 6614181 (2003-09-01), Harvey et al.
patent: 6619819 (2003-09-01), Stowell et al.
patent: 6623133 (2003-09-01), Keogh
patent: 6631726 (2003-10-01), Kinoshita et al.
patent: 6635117 (2003-10-01), Kinnard et al.
patent: 6657206 (2003-12-01), Keogh et al.
patent: 6663792 (2003-12-01), Fayfield et al.
patent: 6664737 (2003-12-01), Berry et al.
patent: 6696801 (2004-02-01), Schmitkons et al.
patent: 6709807 (2004-03-01), Hallock et al.
patent: 6732451 (2004-05-01), Conwell et al.
patent: 6734120 (2004-05-01), Berry et al.
patent: 6753506 (2004-06-01), Liu et al.
patent: 6756085 (2004-06-01), Waldfried et al.
patent: 6761796 (2004-07-01), Srivastava et al.
patent: 6818864 (2004-11-01), Ptak
patent: 6831419 (2004-12-01), Schmitkons et al.
patent: 6894285 (2005-05-01), Kleinschmidt et al.
patent: 7030045 (2006-04-01), Johnson
patent: 7077547 (2006-07-01), Schmitkons et al.
patent: 7079740 (2006-07-01), Vandroux et al.
patent: 7081638 (2006-07-01), Augur
patent: 7087482 (2006-08-01), Yeo et al.
patent: 7119904 (2006-10-01), Coffin et al.
patent: 7126687 (2006-10-01), Hill et al.
patent: 7265061 (2007-09-01), Cho et al.
patent: 7362416 (2008-04-01), Ito et al.
patent: 7411203 (2008-08-01), Fomenkov et al.
patent: 7449704 (2008-11-01), Fomenkov etal.
patent: 7499154 (2009-03-01), Stock et al.
patent: 2002/0073922 (2002-06-01), Frankel et al.
patent: 2002/0106500 (2002-08-01), Albano et al.
patent: 2003/0015223 (2003-01-01), Jacksier et al.
patent: 2003/0020027 (2003-01-01), Danvers
patent: 2003/0037802 (2003-02-01), Nakahara et al.
patent: 2003/0054115 (2003-03-01), Albano et al.
patent: 2003/0102491 (2003-06-01), Yang et al.
patent: 2003/0111438 (2003-06-01), Mukai et al.
patent: 2003/0139035 (2003-07-01), Yim et al.
patent: 2003/0205553 (2003-11-01), Nakahara et al.
patent: 2004/0021428 (2004-02-01), Swami et al.
patent: 2004/0055636 (2004-03-01), Rocha-Alvarez et al.
patent: 2004/0058090 (2004-03-01), Waldfried et al.
patent: 2004/0065852 (2004-04-01), Harrell et al.
patent: 2004/0096593 (2004-05-01), Lukas et al.
patent: 2004/0096672 (2004-05-01), Lukas et al.
patent: 2004/0099283 (2004-05-01), Waldfried et al.
patent: 2004/0113089 (2004-06-01), Janos et al.
patent: 2004/0155591 (2004-08-01), Schmitkons et al.
patent: 2004/0175501 (2004-09-01), Lukas et al.
patent: 2004/0175957 (2004-09-01), Lukas et al.
patent: 2004/0183481 (2004-09-01), Borsuk et al.
patent: 2005/0040341 (2005-02-01), Schmitkons
patent: 2005/0064298 (2005-03-01), Silverman
patent: 2005/0241579 (2005-11-01), Kidd
patent: 2005/0263719 (2005-12-01), Ohdaira et al.
patent: 2006/0141806 (2006-06-01), Waldfried et al.
patent: 2006/0165904 (2006-07-01), Ohara
patent: 2006/0249175 (2006-11-01), Nowak et al.
patent: 2006/0251827 (2006-11-01), Nowak et al.
patent: 2007/0278419 (2007-12-01), Zani et al.
patent: 2007/0278428 (2007-12-01), Zani et al.
patent: 2007/0286963 (2007-12-01), Rocha-Alvarez et al.
patent: 2008/0075858 (2008-03-01), Koh
patent: 10241330 (2003-09-01), None
patent: 0 675 211 (1995-10-01), None
patent: 04225521 (1992-08-01), None
patent: 09120950 (1997-05-01), None
patent: 11111713 (1999-04-01), None
Vig. John., Handbook of Semiconductor Wafer Cleaning Technology, Noyes Publications, 1993. Chapter 6: 233-273.
Waldfried, Carlo, Han, Qingyuan, Escorcia, Orlando, Margolis, Ari, Albano, Ralph, and Berry, Ivan, “Single Wafer RapidCuring™ of Porous Low-k Materials”, Axcelis Technologies, Inc., 2002 IEEE, 0-7803-7216/02, pp. 226-228.
http://www.nordson.com/Businesses/UV/IndustrialUV/, Industrial UV Systems, Nordson's CoolWave™, Apr. 7, 2005.
http://www.nordson.com/Businesses/UV/PrimarcLamps/, Primarc UV Curing Lamps, Apr. 7, 2005.
http://www.nordson.com/Businesses/UV/IndustrialUV/, CoolWave® Systems, Apr. 7, 2005.
PCT International Search Report dated Sep. 25, 2006.
The First Office Action for Chinese Patent Application 200680014799.3 dated Jun. 12, 2009.
Korean Office Action “Notice to File a Response” in Patent Application No. 10-2007-7024761 dated Sep. 16, 2009.
Nordson Corporation, “Coolwave® 306 System,” revised Nov. 2008, 2 pages, UVL-08-3127, from Internet at “http://www.nordson.com/NR/rdonlyres/81D7F83B-585F-4CF5-B002-E637EE0C1CD7/0/UVL3127CoolWave306.pdf”.
Nordson Corporation, “Coolwave® 410 System,” revised Apr. 2009, 2 pages, UVL-09-3786, from internet at “http://www.nordson.com/NR/rdonlyres/85426585-9FBA-4977-8929-7E3A242922/0/UVL3786.pdf”.
Nordson Corporation, “Coolwave® 610 System,” revised Oct. 2008, 2 pages, UVL-08-3116, from Internet at “http://www.nordson.com/NR/rdonlyres/18620695-C7AF-4171-9BA6-9030CE1A92FE/0/UVL3116CoolWave2610.pdf”.
Maitland, “Cure - UV Printing & Coating Facts Worth Knowing,” Nordson, dated Mar. 20, 2004, 5 pages, from internet at “http://www.nordson.com/NR/rdonlyres/725A7649-6EDE-4850-BF1AACDB045BABB9/0/Cure.pdf”.
Primarc UV Technology, “About UV Curing Technology,” from the internet at “http://www.nordson.conn/Businesses/PrimarciTechnology/”.
Prosecution History of U.S. Appl. No

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